Antireflective coatings are critical to many optical systems such as ophthalmic lenses. It is well known that creating textured nanostructures can be an alternative approach for the conventional deposition of thin layer in order to achieve broadband antireflective properties.
The highly-ordered, high aspect ratio nanostructured coating on top of polymer substrates, is fabricated utilizing block copolymer self-assembly, sequential infiltration synthesis (SIS), and reactive ion etching (RIE). This project demonstrated the fabrication of textured nanoscale structures within SiO2/polymer substrates with ~30 nm ordered pillars, which have shown partial reduction in reflection.
- Prevent any damage to the temperature sensitivity polymer lenses, the process can be performed entirely at low temperatures (below 80°)
- Tunable chemistry
- Substrate passivation process was developed to overcome reactivity between the polymer lens and the SIS precursors
Applications and Opportunities
- Suppression of light reflection of for various optical applications to increase lenses efficiency and contrast