Fullerene ion beam Nano–Writer



Chemistry and Materials

The Technology

The need to write and engrave or analyze nano structures for nanofabrication is usually met by metal ion bombarding (FIB, LMIS). Those methods main drawbacks are damage to the upper layers and metal ions contamination.
Using C60 rays created from gas phase with high brightness and sub-micron focus capabilities overcomes these obstacles. The layer or structure that is created can be later transformed to other nano carbon structures for carbon-based electronics


  • No contamination
  • Applicable on organic and biological surfaces

Applications and Opportunities

  • Nano level fabrication and analysis
  • Semiconductors manufacturing
arrow Business Development Contacts
Shikma Litmanovitz
Director of Business Development, Physical Science