The Technology
The need to write and engrave or analyze nano structures for nanofabrication is usually met by metal ion bombarding (FIB, LMIS). Those methods main drawbacks are damage to the upper layers and metal ions contamination.
Using C60 rays created from gas phase with high brightness and sub-micron focus capabilities overcomes these obstacles. The layer or structure that is created can be later transformed to other nano carbon structures for carbon-based electronics
Advantages
- No contamination
- Applicable on organic and biological surfaces
Applications and Opportunities
- Nano level fabrication and analysis
- Semiconductors manufacturing
Business Development Contacts